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FACILITY NAME | ADDRESS | CHEMICAL | INDUSTRY | YEAR | PRIOR YEAR RELEASE * | CURRENT YEAR RELEASE * | PERCENT CHANGE | POLLUTION PREVENTION INFORMATION (ACTIVITY CODES/TEXT) |
---|---|---|---|---|---|---|---|---|
NXP USA - CHANDLER (NA)![]() |
1300 N ALMA SCHOOL RD CH404 CHANDLER, AZ 85224 |
Sulfuric Acid (1994 And After "Acid Aerosols" Only) | 334413: Semiconductor and Related Device Manufacturing | 2008 | 2,200.00 | 727.00 | -66.95% |
W58: Other process modifications Extended bath life of product cleaning chemical resulting in usage & emissions reduction. |
NXP USA - CHANDLER (NA)![]() |
1300 N ALMA SCHOOL RD CH404 CHANDLER, AZ 85224 |
Ozone | 334413: Semiconductor and Related Device Manufacturing | 2005 | 1,900.00 | 820.00 | -56.84% | Ozone destruct unit installed in 2005 on one tool. The rest of the tools already had ozone abatement. |
NXP USA - CHANDLER (NA)![]() |
1300 N ALMA SCHOOL RD CH404 CHANDLER, AZ 85224 |
Ethylene Glycol | 334413: Semiconductor and Related Device Manufacturing | 2008 | 6,035.00 | 2,810.00 | -53.44% |
W61: Changed to aqueous cleaners (from solvents or other materials) Details about this pollution prevention effort reported in Pollution Prevention Plan and submitted to Arizona Department of Environmental Quality |
NXP USA - CHANDLER (NA)![]() |
1300 N ALMA SCHOOL RD CH404 CHANDLER, AZ 85224 |
Lead Compounds | 334413: Semiconductor and Related Device Manufacturing | 2013 | 113.33 | 54.92 | -51.54% |
W42: Substituted raw materials - Reducing lead plating. Replacing with non lead plating |
NXP USA - CHANDLER (NA)![]() |
1300 N ALMA SCHOOL RD CH404 CHANDLER, AZ 85224 |
Ethylene Glycol | 334413: Semiconductor and Related Device Manufacturing | 2002 | 420.00 | 220.00 | -47.62% |
W58: Other process modifications |
NXP USA - CHANDLER (NA)![]() |
1300 N ALMA SCHOOL RD CH404 CHANDLER, AZ 85224 |
Hydrochloric Acid (1995 And After "Acid Aerosols" Only) | 334413: Semiconductor and Related Device Manufacturing | 2008 | 1,275.00 | 808.00 | -36.63% |
W58: Other process modifications Extended bath life of product cleaning chemical resulting in usage & emissions reduction. |
NXP USA - CHANDLER (NA)![]() |
1300 N ALMA SCHOOL RD CH404 CHANDLER, AZ 85224 |
Lead Compounds | 334413: Semiconductor and Related Device Manufacturing | 2015 | 91.28 | 59.64 | -34.66% |
W42: Substituted raw materials - Reducing lead plating. Replacing with non lead plating |
NXP USA - CHANDLER (NA)![]() |
1300 N ALMA SCHOOL RD CH404 CHANDLER, AZ 85224 |
Hydrochloric Acid (1995 And After "Acid Aerosols" Only) | 334413: Semiconductor and Related Device Manufacturing | 1995 | 34.00 | 27.00 | -20.59% |
W13: Improved maintenance scheduling, recordkeeping, or procedures |
NXP USA - CHANDLER (NA)![]() |
1300 N ALMA SCHOOL RD CH404 CHANDLER, AZ 85224 |
Ethylene Glycol | 334413: Semiconductor and Related Device Manufacturing | 2011 | 1,626.00 | 1,379.00 | -15.19% |
W61: Changed to aqueous cleaners (from solvents or other materials) |
NXP USA - CHANDLER (NA)![]() |
1300 N ALMA SCHOOL RD CH404 CHANDLER, AZ 85224 |
Sulfuric Acid (1994 And After "Acid Aerosols" Only) | 334413: Semiconductor and Related Device Manufacturing | 1992 | 1.00 | 1.00 | 0% |
W58: Other process modifications |
NXP USA - CHANDLER (NA)![]() |
1300 N ALMA SCHOOL RD CH404 CHANDLER, AZ 85224 |
Phosphoric Acid | 334413: Semiconductor and Related Device Manufacturing | 1998 | 250.00 | 510.00 | 104% |
W58: Other process modifications |
NXP USA - CHANDLER (NA)![]() |
1300 N ALMA SCHOOL RD CH404 CHANDLER, AZ 85224 |
Hydrogen Fluoride | 334413: Semiconductor and Related Device Manufacturing | 1998 | 970.00 | 2,000.00 | 106.19% |
W58: Other process modifications |
* - Dioxin releases are in grams; all others in pounds