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Facility ID: 05452BMXXX1000R
Facility Name and Address: GLOBALFOUNDRIES U.S. 2 LLC - VERMONT FACILITY 1000 RIVER ST ESSEX JUNCTION, VT 05452 Parent Company: GLOBALFOUNDRIES US INC Industry: Semiconductor and Related Device Manufacturing (334413) Chemical: Hydrochloric acid (acid aerosols including mists, vapors, gas, fog, and other airborne forms of any particle size) Reports: View TRI Facility profile report for this facility View TRI Form R submissions by this facility |
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Production Related Waste Management for Selected Chemical
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Pollution Prevention Activities for Selected Chemical
Reporting Year | Section 8.10: Newly Implemented Source Reduction Activity | Section 8.10: Methods to Identify Activity | Section 8.11: Optional Pollution Prevention Information* |
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2022 |
Source Reduction:: S25: Other process modifications made
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Methods to Identify SR Opportunities: T04: Participative team management
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2021 |
Source Reduction:: S25: Other process modifications made
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Methods to Identify SR Opportunities: T04: Participative team management
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2020 |
Source Reduction:: W58: Other process modifications
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Methods to Identify SR Opportunities: T04: Participative team management
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2019 |
Source Reduction:: W58: Other process modifications
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Methods to Identify SR Opportunities: T04: Participative team management
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2018 |
Source Reduction:: W58: Other process modifications
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Methods to Identify SR Opportunities: T04: Participative team management
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W58: Project 1: POST BPSG Chemical Mechanical Polish clean elimination: This step utilized Hydrochloric Acid, Hydrogen peroxide, sulfuric acid, Dilute Hydrofluoric Acid, and Ammonium Hydroxide.Project 2: Chemical optimizations on the FSI tools (Hydrochloric Acid, Sulfuric Acid and Hydrogen Peroxide). A newer process was qualified on the FSI spray tools that runs a reduced process recipe time. Full technical feasibility assessments were completed and the project is fully implemented on certain high volume technologies. |
2017 |
Source Reduction:: W42: Substituted raw materials
Source Reduction:: W58: Other process modifications |
Methods to Identify SR Opportunities: T04: Participative team management
Methods to Identify SR Opportunities: T04: Participative team management |
W42: Mask House project for Hydrochloric Acid (HCl) and Ammonium Hydroxide reduction by replacing the chromium wet etch with a dry etch. The dry chromium etching process, uses a chlorine and oxygen plasma to remove the exposed chromium eliminating the use of Ammonia, Sulfuric, and Hydrochloric chemicals in these steps. W58: Project 1: POST BPSG Chemical Mechanical Polish clean elimination: This step utilized Hydrochloric Acid, Hydrogen peroxide, sulfuric acid, Dilute Hydrofluoric Acid, and Ammonium Hydroxide.Project 2: Post Chemical Mechanical Polish Mc A/B Clean elimination: A clean step post Chemical Mechanical polish process was eliminated. This step utilized Hydrofluoric acid and Ammonium Hydroxide.Project 3: Chemical optimizations on the FSI tools (Hydrochloric Acid, Sulfuric Acid and Hydrogen Peroxide). A newer process was qualified on the FSI spray tools that runs a reduced process recipe time. Full technical feasibility assessment was completed in 2017 and currently the project is in a 30% phase in on certain high volume technologies. |
2016 |
Source Reduction:: W42: Substituted raw materials
Source Reduction:: W58: Other process modifications Source Reduction:: W78: Other surface preparation and finishing modifications |
Methods to Identify SR Opportunities: T01: Internal pollution prevention opportunity audit(s)
Methods to Identify SR Opportunities: T04: Participative team management Methods to Identify SR Opportunities: T04: Participative team management Methods to Identify SR Opportunities: T04: Participative team management |
W42: Migrated some of the wet etch processes that use hydrochloric acid in the mask manufacturing line to a dry etch process. In 2015, full qualification and 25 % of this conversion were completed. The full implementation occurred in 2016. This resulted in the following chemical savings: 836 gals of PEH-3 (Hydrochloric Acid containing chemistry), 656 gals of CR-7 etchant, 435 gals of sulfuric acid W58: In 2016, the surface prep team worked on optimizing multiple chemical cleaning steps, and where technically feasible combining them into one chemical cleaning step, thus resulting in process optimizations and associated chemical savings. The chemical savings resulting from multiple process optimizations in 2016 were as follows: Ammonium Hydroxide 827 gals, Hydrogen Peroxide 3537 gals, Hydrochloric Acid 672 gals, Isopropyl Alcohol 8818 gals, Sulfuric Acid 5683 gals, Hot DI 694,230 gals, Cold DI water 390,512 gals, Hydrofluoric Acid 41 gals W78: Product Batch Size Optimizations for optimized chemical use: In 2015, the surface prep team began evaluation of batch size optimizations on certain manufacturing tools. The goal of this project was to optimize batch size so more product could be run using the same amount of chemical. The idea was implemented in 2016. The chemicals optimized included hydrofluoric acid, sulfuric acid, hydrogen peroxide, hydrochloric acid, and ammonium hydroxide. Chemical savings from batching were 13% on one tool set and 24 % on the other tool set. |
2015 |
Source Reduction:: W42: Substituted raw materials[-0-4%]
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Methods to Identify SR Opportunities: T01: Internal pollution prevention opportunity audit(s)
Methods to Identify SR Opportunities: T04: Participative team management |
Source Reduction: Source Reduction - W42: Migrated some of the wet etch processes that use hydrochloric acid in the mask manufacturing line to a dry etch process. In 2015, full qualification and 25 % of this conversion were completed. The full implementation will occur in 2016. |
2014 |
Source Reduction:: W13: Improved maintenance scheduling, recordkeeping, or procedures[-15-24%]
Source Reduction:: W42: Substituted raw materials[-0-4%] Source Reduction:: W82: Modified design or composition of product[-0-4%] |
Methods to Identify SR Opportunities: T04: Participative team management
Methods to Identify SR Opportunities: T01: Internal pollution prevention opportunity audit(s) Methods to Identify SR Opportunities: T04: Participative team management Methods to Identify SR Opportunities: T04: Participative team management |
Source Reduction - (1) Hydrochloric acid air emissions were reduced by 18.4% in 2014 due to increased hydrochloric acid treatment efficiency on a central treatment unit at the facility. The increased treatment efficiency was realized due to optimized maintenance on the treatment unit. (2) Migrated some of the wet etch processes that use hydrochloric acid in the mask manufacturing line to a dry etch process. The migration began in October 2014, which resulted in a 70 pound decrease in this process in 2014. For 2015, we are hoping to move even more product to the dry process. (3) Hydrogen chloride gas usage decreased by approximately 5800 pounds in 2014 mostly due to a change in the product technology mix being manufactured in 2014. |
2013 |
Source Reduction:: W58: Other process modifications
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Methods to Identify SR Opportunities: T01: Internal pollution prevention opportunity audit(s)
Methods to Identify SR Opportunities: T04: Participative team management |
W58: Tool consolidations in 2013 resulted in a reduction in the use of hydrochloric acid in that tool set by approximately 157 gallons per year. |
2012 |
Source Reduction:: W58: Other process modifications
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Methods to Identify SR Opportunities: T01: Internal pollution prevention opportunity audit(s)
Methods to Identify SR Opportunities: T04: Participative team management |
W58: Evaluated and qualified the eliminiation of a cleaning process step involving two chemicals for certain wafer technologies. One of the cleaning chemicals eliminated contained hydrochloric acid. |
2011 |
Source Reduction:: W52: Modified equipment, layout, or piping
Source Reduction:: W58: Other process modifications |
Methods to Identify SR Opportunities: T04: Participative team management
Methods to Identify SR Opportunities: T04: Participative team management |
W52: The use of a new air abatement technology for a specific semiconductor manufacturing tool set will improve the hydrogen chloride removal efficiency and significantly reduce chlorine emissions from that tool set. W58: An equipment upgrade and a process change resulted in a significant reduction in the use of Hydrochloric acid on a semiconductor process tool. |
2010 |
Source Reduction:: W52: Modified equipment, layout, or piping
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Methods to Identify SR Opportunities: T04: Participative team management
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Other Environmental Practices - Installation of new air abatement technology that has resulted in the reduction of Chlorine and Hydrogen Chloride emissions from the sites manufacturing operations. |
2009 |
Source Reduction:: W19: Other changes in operating practices
Source Reduction:: W58: Other process modifications |
Methods to Identify SR Opportunities: T04: Participative team management
Methods to Identify SR Opportunities: T04: Participative team management |
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1994 |
Source Reduction:: W58: Other process modifications
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Methods to Identify SR Opportunities: T11: Other
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1992 |
Source Reduction:: W58: Other process modifications
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Methods to Identify SR Opportunities: T04: Participative team management
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1991 |
Source Reduction:: W55: Changed from small volume containers to bulk containers to minimize discarding
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Methods to Identify SR Opportunities: T04: Participative team management
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