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Facility ID: 87124NTLCR4100S

Facility Name and Address:
INTEL CORP - RIO RANCHO

4100 SARA RD M S RR5-491
RIO RANCHO, NM 87124

Parent Company: INTEL CORP

Industry: Semiconductor and Related Device Manufacturing (334413)

Reports:
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Production Related Waste Management for Selected Facility


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    Waste Management by Chemical -
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Pollution Prevention Activities for Selected Facility



List all P2 activities for this facility
Chemical Name P2 Report 5-Year Waste Trend 2019 2018 2017 2016 2015 2014 2013 2012 2011 2010 2009 2008 2007 2006
Ammonia -40% No P2 No P2 No P2 P2 No P2 No P2 No P2 No P2 P2 P2 No P2 No P2 No P2 No P2
Certain glycol ethers -67% No P2 No P2 No P2 No P2 No P2 P2 No P2 No P2 P2 No P2 No P2 No P2 No P2 -
Copper compounds -44% - No P2 No P2 No P2 No P2 No P2 No P2 P2 No P2 No P2 No P2 P2 P2
Ethylene glycol 100+% No P2 No P2 No P2 No P2 No P2 P2 No P2 No P2 No P2 No P2 No P2 No P2 - No P2
Hydrogen fluoride -33% No P2 No P2 No P2 No P2 No P2 P2 No P2 No P2 No P2 No P2 No P2 No P2 No P2 No P2
N-Methyl-2-pyrrolidone 100+% No P2 No P2 No P2 No P2 No P2 P2 No P2 No P2 No P2 No P2 No P2 No P2 No P2 No P2
Nitrate compounds (water dissociable; reportable only when in aqueous solution) -80% No P2 No P2 No P2 No P2 No P2 P2 No P2 No P2 No P2 No P2 No P2 No P2 No P2 No P2
Nitric acid -83% No P2 No P2 No P2 No P2 No P2 P2 No P2 No P2 No P2 No P2 No P2 No P2 No P2 No P2
Ozone NA - - - - - P2 No P2 No P2 No P2 No P2 No P2 - - -
  • P2: P2 information provided on Form R
  • No P2: No P2 information provided on Form R
  • B: Barriers reported
  • -: Form R not submitted